Loading...
Send to Friend
 Bookmark
 Review List
  1. Simple search
  2. Search result
  3. Role of nitrogen doping at the surface of titanium nitride thin films towards capacitive charge storage enhancement
Role of nitrogen doping at the surface of titanium nitride thin films towards capacitive charge storage enhancement
1483 viewed

Role of nitrogen doping at the surface of titanium nitride thin films towards capacitive charge storage enhancement

Achour, A

Role of nitrogen doping at the surface of titanium nitride thin films towards capacitive charge storage enhancement

Achour, A ; Sharif University of Technology

1483 Viewed
  1. Type of Document: Article
  2. DOI: 10.1016/j.jpowsour.2017.05.074
  3. Abstract:
  4. We recently reported an impressive cycling stability (over 20,000 cycles) of titanium nitride (TiN) electrodes with high specific capacitance. It is anticipated that nitrogen (β−N) doping in the oxidized surface of TiN film plays a crucial role in charge storage mechanism and stability of this material. In this work, we offer an evidence on the effect of β−N doping on improvement in specific capacitance of vacuum annealed TiN thin films. The annealing of the TiN films leads to the diffusion of the excess β−N from sub-surface to oxidized TiN film surface without further oxidation of the electrode surface. We demonstrate an increase in the TiN areal capacitance upon an increase in the amount of β−N dopant. The areal capacitance of the annealed films was enhanced by 3-fold (8.2 mF cm−2 in K2SO4 aqueous electrolyte) without sacrificing the cycling stability of the electrodes after more than 10,000 consecutive charge/discharge cycles. © 2017 Elsevier B.V
  5. Keywords:
  6. Electrochemical capacitors ; Nitrogen doping ; Oxidized surface ; Annealing ; Capacitance ; Electrodes ; Electrolytes ; Metallic films ; Nitrides ; Nitrogen ; Oxidation ; Semiconductor doping ; Thin films ; Titanium ; Titanium compounds ; Charge/discharge cycle ; Electrochemical capacitor ; High specific capacitances ; Oxidized surfaces ; Specific capacitance ; Thermal-annealing ; Titanium nitride thin films ; Titanium nitride
  7. Source: Journal of Power Sources ; Volume 359 , 2017 , Pages 349-354 ; 03787753 (ISSN)
  8. URL: https://www.sciencedirect.com/science/article/abs/pii/S0378775317307255