Deposition of Nanoporous Metallic Thin Films by Sputtering and Comparing with Electrochemical Method (Electroplating)

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لایه نشانی فلزات نانو متخلخل از طریق کندوپاش و مقایسه آن با روش الکتروشیمیایی (آبکاری الکتریکی)

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Type of Document: M.Sc. Thesis
Language: Farsi
Document No: 44806 (05)
University: Sharif University of Technology
Department: Electrical Engineering
Advisor(s): Rashidian, Bijan
Abstract:
Porous thin films have becom very atractive due to their applications in many types of electronic and optical devices. There are several methods for deposition of such films. Chemical method for deposition of nanoporous thin films are relatively simple, but usually hard to control. In this thesis, chemical deposition of thin porous Molybden films is reported. In addition, an available sputtering system has been modified and, controlled porosity thin films were then deposited on glass and silicon substrates using GLAD method.These films have been characerized, and compared with chemically deposited porous thin films
Keywords:
Electrochemical Method ; Sputtering ; Nanoporous Materials

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